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Surfx Technologies LLC
Press Release

Surfx Technologies Releases a New Generation of Atmospheric Pressure Plasma Systems

Culver City, CA. – June, 2008: Surfx Technologies, a pioneer in atmospheric pressure plasma systems introduces its latest Atomflo™ 400 plasma system for surface treatment and thin-film deposition.

The Atomflo™ atmospheric plasma system is used for high-speed treatment of two and three dimensional surfaces prior to bonding, marking, painting, and coating. The Atomflo™ delivers consistent and uniform treatment for improved reliability and quality.

The latest Atomflo™ system offers improved functionality and user friendliness. New features include locked and timed modes and real-time data logging enable rapid integration into manufacturing lines. A larger, easy-to-read graphical LCD screen highlights the updated control panel. Both CE and ETL certification make the Atomflo available anywhere in the world.

The Atomflo™ 400 plasma systems are provided with a variety of Surfx Technologies' applicators to best suit your surface treatment needs. The applicators are lightweight and ergonomic for either handheld or robot operation. There are no moving parts for trouble-free use and setup can be completed in 10 minutes.

Atmospheric pressure plasmas eliminate the need for harsh chemicals or inefficient vacuum chambers that are difficult to integrate into the process flow. Atomflo™ tools are suitable for a variety of applications- include bonding composite materials, treating, cleaning or sterilizing medical-grade plastics and metals, stripping organic contamination, and depositing glass films.

The Atomflo™ atmospheric pressure plasma generates a stream of reactive gas at low temperatures. Many materials can be treated, including polymers, fabrics, metals, composites, semiconductors, glass, and integrated circuits. The target material is placed within a centimeter downstream of the plasma source. Ions remain trapped between the electrodes, preventing damage to sensitive materials.

The plasma operates near room temperature at atmospheric pressure with helium as the primary gas, and a reagent gas such as oxygen, hydrogen, nitrogen, or carbon tetrafluoride. The process chemistry is determined by the reagent gas employed.

Surfx Technologies offers application support with a state-of-the-art lab and talented engineers to assist you with your surface modification needs. Rental systems are also available for on-site evaluations.

Surfx Technologies LLC was founded in 1999 to bring to the marketplace new tools for materials manufacturing. The company's atmospheric plasma products are based upon inventions exclusively licensed from the University of California, Los Angeles (UCLA). The company started selling Atomflo™ products in 2002 and sales have been growing rapidly since.

For further information, contact:

Shamir Merino
Director of Sales and Marketing
Surfx Technologies LLC
3617 Hayden Avenue
Culver City, CA 90232 USA
(310) 558-0770 Ext. 114
merino@surfxtechnologies.com
www.surfxtechnologies.com

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